Articles of manufacture containing increased stability low concentration gases and methods of making and using the same

ABSTRACT

Articles of manufacture and methods of making and using same concern a container having an internal space and a passivated internal metal surface. The container contains a composition of an acid gas and a balance gas contained within the internal space and in contact with the passivated internal metal surface. The stability of the acid gas concentration over time is enhanced.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation in part, from: provisional patentapplication Ser. No. 60/583,126, filed Jun. 25, 2004; copendingnon-provisional patent application Ser. No. 11/063,928, filed Feb. 22,2005 which is a divisional of non-provisional patent application Ser.No. 10/157,468, filed May 29, 2002, now abandoned; and fromnon-provisional patent application Ser. No. 10/157,466, filed May 29,2002 now abandoned, now published as US 2003/0017359 A1, which claimspriority to provisional patent application Ser. No. 60/306,014, filedJul. 17, 2001. Each of these applications are incorporated by referenceherein.

BACKGROUND OF THE INVENTION

Moisture is known to react with so-called “acid gases”, such as hydrogensulfide, carbonylsulfide, carbondisulfide and mercaptans (mercaptans arealso referred to as thiols) to form a complex compound. (The term “acidgas” is used herein to denote either gas phase, liquid phase, or mixtureof gas and liquid phases, unless the phase is specifically mentioned.)

One problem presents itself: if one is interested in producing acid gasstandard compositions, in other words acid gases having a knownconcentration of one of these gases in a matrix or carrier fluid, thenone must consider how to reduce or remove the moisture. Gas standardsmay have to have, and preferably do have, a long shelf life, since thestandard acid gas may not be required immediately after production. Asource of acid gas and/or matrix gas may contain a considerable amountof moisture. Therefore, the reduction or removal of moisture from theacid gas is important if the stability of the acid gas in the standardgas is to be maintained.

U.S. Pat. Nos. 5,255,445 and 5,480,677 describe processes for drying andpassivating a metal surface to enhance the stability of gas mixturescontaining one or more gaseous hydrides in low concentrations in contacttherewith. The process comprises purging gas in contact with the metalsurface with inert gas to remove the purged gas, exposing the metalsurface to an amount of a gaseous passivating or drying agent comprisingan effective amount of a gaseous hydride of silicon, germanium, tin orlead and for a time sufficient to passivate the metal surface, andpurging the gaseous passivating agent using inert gas. Optionally, anoxidizing agent is applied after the third step to stabilize theadsorbed stabilizing agent. The patent also mentions prior knownprocesses, such as saturation passivation, where the container issubjected to several cycles of evacuating and filling with a much higherconcentration of the same gaseous hydride, prior to being filled withthe low concentration hydride mixture of interest. The two patents donot mention or describe processes to passivate containers adapted tostore sulfur-containing gases, nor do they mention passivationtechniques in which a first passivating agent is applied to the surface,followed by contacting with a higher concentration of the gas to bestored.

Co-pending application Ser. No. 10/157,467, filed on May 29, 2002describes the use of certain acid gas resistant molecular sieves toreduce or remove moisture from fluid compositions comprising asulfur-containing compound. There is no disclosure or suggestion,however, for the passivation of containers adapted to contain themoisture-reduced compositions. Such containers may have moisture adheredto the internal surfaces, which can and does react with acid gases,reducing their stability and shelf-life.

A second, related problem involves the containers that the reactive gasstandards are stored in. If metal or metal lined, reactive gases willreact with and/or become adsorbed onto the metal, and will ultimatelychange the concentration of the reactive gas.

Grossman et al. (U.S. Pat. No. 4,082,834) describes alloys, such asalloys of nickel, titanium, and zirconium, that react with water andreactive gases (such as hydrogen, hydrogen-containing compounds such ashydrocarbons, carbon monoxide, carbon dioxide, oxygen, and nitrogen) attemperatures ranging from about 200° C. to about 650° C. While thepatent: does not discuss acid gases, it is apparent that hydrogensulfide, carbonyl sulfide, and mercaptans are hydrogen-containingcompounds, so that there would not be any expected benefits using thesealloys to remove moisture from these acid gases. While carbondisulfidedoes not contain hydrogen, and therefore there could be some moisturereduction from a composition comprising carbondisulfide and moistureusing these alloys, the high temperature is prohibitive for commercialuse.

Tamhankar et al. (U.S. Pat. No. 4,713,224) describes a one-step processfor removing minute quantities of impurities from inert gases, where theimpurities are selected from the group consisting of carbon monoxide,carbon dioxide, oxygen, hydrogen, water and mixture thereof. The processcomprises contacting the gas with a particulate material comprised ofnickel in an amount of at least about 5% by weight as elemental nickeland having a large surface area, from about 100 to about 200 m²/g. Thereis no disclosure of removal of moisture from reactive gases; there istherefore no discussion or suggestion of moisture removal from reactivegases, moisture removal from matrix gases and mixing same to form astandard gas composition.

Tom et al (U.S. Pat. Nos. 4,853,148 and 4,925,646) discloses processesand compositions for drying of gaseous hydrogen halides of the formulaHX, where X is selected from the group consisting of bromine, chlorine,fluorine, and iodine. The patent describes the use of, for example, anorganometallic compound such as an alkylmagnesium compound, on asupport. The halide is substituted for the alkyl functional group.Suitable supports are, alumina, silica, and aluminosilicates (natural orsynthetic). However, there is no description or suggestion of reducingor removing moisture from sulfur-containing reactive gases, or ofremoval of moisture from matrix gases and mixing the reduced moisturegases to form a standard gas. Alvarez, Jr. et al. (U.S. Pat. No.5,910,292) describes a process and apparatus for removal of water fromcorrosive halogen gases, using a high silica zeolite, preferably highsilica mordenite. The patent describes removing moisture down to lessthan or equal to 100 ppb water concentration in halogen gases,particularly chlorine- or bromine-containing gases, but once again,there is lacking any teaching of suggestion of standard gascompositions. U.S. Pat. No. 6,183,539 discloses utilizing high sodium,low silica faujasite particles for the adsorption of carbon dioxide andwater vapor from gas streams. The disclosed types of gas streams inwhich this type of high sodium, low silica faujasite crystals can beutilized includes air, nitrogen, hydrogen, natural gas, individualhydrocarbons and monomers, such as ethylene, propylene, 1,3 butadiene,isoprene and other such gas systems. There is no mention ofsulfur-containing acid gas purification using the faujasites, orproduction of standard gas compositions.

U.S. Pat. No. 4,358,627 discloses use of “acid resistant” molecularsieves, such as that known under the trade designation “AW300”, forreducing the chloride concentration in chlorinated liquid hydrocarbonsthat contain an ethylenically unsaturated chlorinated hydrocarbon, waterand hydrogen chloride. The method includes providing certainnitrogen-containing compounds in the system and contacting the systemwith the molecular sieve. There is no disclosure or suggestion, however,of removal or reduction of moisture from gas phase compositions, orproduction of standard gas compositions.

With respect to sulfur compounds, one impetus for measurement of lowlevels of these compounds has come from the hydrocarbon process industrywhere the requirement for lower sulfur measurements is steadilyincreasing. Controlling the concentration of sulfur is quite importantfor two major reasons. First, low sulfur content in simple olefin feedstock for high purity linear polymers such as polyethylene andpolypropylene is quite important. Sulfur compounds adsorb onto thesurface of the catalysts and prevent the desired reactants from reachingthe catalytic surface thereby deactivating the catalyst. Given thequantity of these products produced annually, the economic impact can bequite significant. Therefore, common sulfur impurities in the feedstock, such as H₂S (hydrogen sulfide) and COS (carbonyl sulfide) must becarefully monitored.

Second, sulfur in the form of sulfur dioxide (SO₂), has been classifiedas a criteria pollutant by the EPA. This translates into strictregulation of emissions from coal burning plants, motor vehicleemissions, and paper and wood pulp processing plants to name a few.Sulfur in coal and gasoline becomes sulfur dioxide when the fuel iscombusted. This SO₂ is a precursor to acid rain. Reducing sulfur in gasnot only lowers sulfur dioxide emissions but also reduces catalyticconverter poisoning. This increases a vehicle's pollution controlefficiency thus reducing other pollutants.

In order to monitor, control and regulate these compounds and otherreactive gases, calibration gas mixtures containing these compounds mustbe used. For these mixtures to be utilized successfully, they must bereliable with respect to stability (shelf life) and concentration.Significant challenges arise as the concentrations of reactive gasmixtures required to calibrate equipment are decreased. Interactions onthe cylinder and tubing surfaces, such as chemical reactions andadsorption, are often insignificant with reactive gas concentrations inthe range of 10 ppm and above. These interactions become quite importantwith reactive gases at concentrations at or below 1 ppm. Impurities,such as moisture, which are present in the source gas can also play amajor role in the stability of these mixtures.

Given the problem of moisture reacting with acid gases and reactivegases in general, it would be advantageous if passivation methods couldbe provided which increase the shelf-life during the storage of thesecompounds.

SUMMARY OF THE INVENTION

In accordance with the present invention, articles of manufacturecontaining increased stability low concentration gases and methods ofmaking and using the same are provided in order to enhance the stabilityof low concentration acid gas compositions within the articles overtime.

A first aspect of the invention relates to an article of manufacturecomprising:

a) a container having an internal space and a passivated internal metalsurface; and

b) a composition comprising an acid gas and a balance gas containedwithin the internal space and in contact with the passivated internalmetal surface; wherein

-   -   i) the acid gas has a concentration in the balance gas of less        than 500 ppb;    -   ii) the acid gas is selected from the group consisting of carbon        disulfide, carbonylsulfide, and compounds within formula (I):        Y—S—X  (I)    -    wherein S is sulfur, X and Y are the same or different and are        independently selected from the group consisting of hydrogen,        alkyl, aryl, oxygen, hydoxyl, amine, aminosilane, oxygen, and        alcohol; and    -   iii) the passivated internal metal surface comprises A) the        reaction product of a silicon-containing material and an        oxygen-containing material and B) the acid gas adsorbed on or in        the passivated internal metal surface in an amount effective to        enhance the stability of the intended concentration over time.

A second aspect of the invention is a method of making an article ofmanufacture containing an acid gas having an intended concentrationwhich is stably maintained over time, the method comprising the stepsof:

exposing an internal metal surface of a container to a first compositioncomprising one or more silicon-containing compounds for a timesufficient to allow at least some of the silicon-containing compound(s)to react with oxygen-containing compounds present to form asilicon-treated surface on at least some of the internal metal surface,the silicon-containing compound(s) selected from the group consisting ofcompounds within the general formula (II):SiR¹R²R³R⁴  (II)wherein R1, R2, R3, and R4 are the same or different and areindependently selected from the group consisting of hydrogen, halogen,alkyl, aryl, amine, halogenated alkyl, and halogenated aryl;

evacuating the container for a time sufficient to remove substantiallyall of the silicon-containing compound(s) that has not reacted with theoxygen-containing compound to form the silicon-treated surface;

exposing the silicon-treated surface to a second composition comprisingan acid gas having a concentration that is greater than an intendedconcentration of the acid gas;

evacuating the container for a time sufficient to remove an amount ofthe second composition to enhance the stability of the intendedconcentration over time; and

filling the container with a third composition comprising the acid gasat the intended concentration.

A third aspect of the invention is a method of calibrating a measurementdevice for measuring a concentration of an acid gas, the methodcomprising the steps of:

providing a manufactured product comprising:

-   -   i) a container having an internal space and a passivated        internal metal surface; and    -   ii) a composition comprising an acid gas and a balance gas        contained within the internal space and in contact with the        passivated internal metal surface; wherein        -   A) the acid gas has an intended concentration of less than            500 ppb;        -   B) the acid gas is selected from the group consisting of            carbon disulfide, carbonylsulfide, and compounds within            formula (I):            Y—S—X  (I)        -   wherein S is sulfur, X and Y are the same or different and            are independently selected from the group consisting of            hydrogen, alkyl, aryl, oxygen, hydoxyl, amine, aminosilane,            oxygen, and alcohol; and        -   C) the passivated internal metal surface comprises I) the            reaction product of a silicon-containing material and an            oxygen-containing material (preferably selected from the            group consisting of moisture, molecular oxygen, metal            oxides, and mixtures thereof), and II) the acid gas adsorbed            on or in the passivated internal metal surface in an amount            effective to enhance the stability of the intended            concentration over time; and

using a portion of the acid gas contained within the manufacturedproduct in a calibration of the measurement device; and

repeating said step of using a portion at least once, wherein a periodof time commencing from a first performance of said step of using aportion and expiring on a later repetition of said step of using aportion is not less than 30 days.

Further aspects and advantages of the invention will become apparent byreviewing the description of preferred embodiments that follow.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows the stability of H₂S concentration in low-level H₂Sstandards over time;

FIG. 2 shows the stability of H₂S concentration in low-level H₂Sstandards over time;

FIG. 3 shows the stability of H₂S concentration in low-level H₂Sstandards over time;

FIG. 4 shows the stability of H₂S and COS concentrations in low-levelH₂S and COS standards over time;

FIG. 5 shows the stability of SO₂ concentration in low-level SO₂ ndardsover time;

FIG. 6 shows the stability of H₂S and COS concentrations in low-levelH₂S and COS standards over time; and

FIG. 7 shows the stability of H₂S concentration in low-level H₂Sstandards over time.

DESCRIPTION OF PREFERRED EMBODIMENTS

While the following discussion focuses on a container which has a metalinternal surface, the description is not limited thereto, and couldapply to a piping or tubing system, a manifold, a gas cylinder having acylinder valve, ton unit, and the like.

Initially, it is preferred to start with an abraded internal metalsurface which has been vacuum baked prior to the reaction of theorganosilane with oxygen-containing compounds.

The internal surface of the container, or the surface to be treated, maybe subject to abrasion prior to reaction of the silicon-containingcompound with oxygen-containing compounds in order to improve adhesionof the reaction product to the metal. Typical abrasion techniques may befound in copending non-provisional patent application Ser. No.10/157,466, filed May 29, 2002, now published as U.S. 2003/0017359 A1.

The preferred vacuum baking step is typically, this is performed at atemperature of from about 30° C. to about 75° C., a duration of time ofno less than 1 hour (preferably no less than 4 hours, even morepreferably no less than 6 hours, and still more preferably no less than12 hours), and a vacuum of no more than 100 torr (preferably no morethan 1 torr and more preferably no more than 0.01 torr).

The internal metal surface is then subjected to the reaction between thesilicon-containing compound and the oxygen-containing compound.

Silicon-containing compounds within the general formula (II) are knownto react with oxygen-containing compounds, such as H₂O, N₂O, CO₂, andthe like, to produce SiO₂, especially when the silicon-containingcompounds are in the gaseous or vapor state.SiR¹R²R³R⁴  (II)

This fact is taken advantage of in the practice of the various aspectsof the invention. The reaction product of a silicon-containing compoundand an oxygen-containing compound such as water forms an amorphous orcrystalline glassy material on the surfaces on which it is deposited.The amorphous or crystalline glassy material may include aluminumsilicide, if the container or surface being treated comprises aluminum.Although the deposited material is referred top herein as a “coating”,it shall be readily understood that in fact the material may depositnon-uniformly, or not at all on certain areas of the surface beingtreated. This coating then serves the function of deactivating a surfacefor the adsorption of molecules of the gas that is ultimately to becontained in the container or piping system at low concentration. Inother words, the coating serves to decrease the number of reactive siteson the metal surface being treated. For simplicity, silicon-containingcompounds within formula (II) shall be referred to as organosilanes,although their formal name under IUPAC convention may differ.

The reaction of an organosilane within general formula (II) withoxygen-containing materials such as water proceeds without catalyst atroom temperature (25° C.); however, it is preferred to carry out thereaction at moderately elevated temperatures, such as temperatureranging from 25° C. up to 100° C., in order to produce the coatings inreasonable time. Most preferably, the temperature is maintained at notmore than 74° C. The pressure of the reaction of an organosilane withwater vapor will generally also proceed at atmospheric pressure,however, the pressure in the container, or near the surface beingtreated, may either be in vacuum or above atmospheric pressure. Thiswill of course depend on the rates of reaction of the organosilane withthe oxygen-containing compound, the desired coating deposition rate, anddesired thickness of the coating. It is of course within the inventionto make layered coatings of two or more organosilane/oxygen-containingcompound reaction products. It is also considered within the inventionto employ two or more organosilanes simultaneously to make a “mixed”coating. Indeed, it is possible that the organosilane may be employed inconjunction with a non-organosilane to form either layered or mixedcoatings.

Silane and organosilanes are toxic materials, and, depending on theorganosilane, pyrophoric. Special care in handling these materials iswarranted, preferably well-ventilated hoods. Electronic grade silane(SiH₄) is available commercially in cylinders from Air Liquide AmericaCorporation, Houston, Tex. Trimethylsilane is available commerciallyfrom Dow Corning Corporation.

Preferred silicon-containing compounds include silane, andmethyl-containing organosilanes; particularly those wherein themethyl-containing organosilane is selected from the group consisting ofmethylsilane, dimethylsilane, trimethylsilane and tetramethylsilane.Preferred organosilane compounds include methylsilane compounds havingthe structure SiH_(n)(CH₃)_(4-n), where n=1 to 3, i.e. methylsilane,dimethylsilane, or trimethylsilane or the structure Si₂H_(m)(CH3)_(6-m),where m=1 to 5. The most preferred organosilane compound ismethylsilane, CH₃SiH₃. The organosilane compounds are hydrolyzed byreaction with water, oxygen or water-containing gases such as humid airand/or other oxygen-containing gases, such that the carbon content ofthe deposited film is from 1 to 50% by atomic weight, preferably about20%.

It is conceivable to employ adjuvants during the reaction of anorganosilane with water. In the practice of the invention, “adjuvant”includes physical and chemical adjuvants, and combinations thereof.Suitable physical adjuvants include electrostatic discharge, plasmadischarge, laser excitation, and the like, under temperatures andpressures suitable for each of these processes. For example, plasmas arepreferably best employed in moderate vacuum. A chemical adjuvant mightinclude an oxidant gas such as oxygen, ozone, chlorine dioxide,combinations thereof, and the like. When a combination of physical andchemical adjuvants is employed, for example ozone and plasma discharge,the reaction product may be described as similar to the films produced bthe process described in U.S. Pat. No. 6,054,379, which is incorporatedherein by reference for its teaching of the production of such films.

Preferably, the silicon-containing composition is % 1 Silane in N₂ andis maintained at 100 psig for 1 day during which it reacts with anyoxygen-containing compounds present, such as moisture or air.

The container or surface to be treated may be selected from the groupconsisting of iron, stainless steel (for example 301, 316, 401),aluminum, aluminum alloy, steel alloys and the like.

Once the metal container inner surface, or metal surface to be treated,is cleaned, and the reaction of organosilane with oxygen-containingcompounds completed (either with or with out adjuvants) to form acoating, the processes of the invention include evacuating the containerfor a time and vacuum sufficient to remove substantially allsilicon-containing compound(s) that has not reacted withoxygen-containing compounds. This first evacuation step preferablyincludes evacuation down to a vacuum of about 1 torr, more preferablydown to 0.01 torr. The temperature during this evacuation process is notcritical, but higher temperatures may tend to increase the removal rateof organosilane. This will be balanced by safety issues, in that highertemperatures may be more hazardous. Therefore, room temperature (about25° C.), or slightly lower or slightly higher than room temperature ispreferred. After the vacuum step is performed, it is followed by a N2fill step.

Subsequent to this first evacuation step, the next step is exposing thecoating to a gas composition, the gas composition having a concentrationof an acid gas that is greater than an intended acid gas concentrationof a manufactured product. The acid gas is caused to contact the coatingand deactivate the surface even further. The acid gas preferably has aconcentration of at least 10 times the concentration of the acid gasthat is to be stored in the container or exposed to the surface, morepreferably has a concentration 50 times greater than the concentrationof the acid gas that is to be stored in the container, still morepreferably 500 times greater than the ultimate concentration, and evenstill more preferably 50,000 times the concentration of the acid gas tobe stored in the container. When H₂S is selected as the acid gas, it ispreferred to perform this step using 5000 ppm H₂S in N₂ at 100 psig.

Typical acid gases in include carbon disulfide, carbonylsulfide, andcompounds within formula (I):Y—S—X  (I)wherein S is sulfur, X and Y are the same or different and areindependently selected from the group of hydrogen, alkyl, aryl, oxygen,hydoxyl, amine, aminosilane, oxygen, and alcohol.

Examples of preferred sulfur-containing compounds within formula (I)include hydrogen sulfide, carbonyl sulfide, sulfur dioxide, methylthiol,ethylthiol, n-propylthiol, i-propylthiol, benzylthiol, and the like.Especially preferred sulfur-containing compunds within formula (I)include hydrogen sulfide, carbonyl sulfide and sulfur dioxide.

The degree of adsorption of the acid gas onto the coating depends in acomplicated way on the composition and physical properties of thecoating, the temperature and pressure employed during this step, as wellas on the chemical and physical properties of the particular acid gasthat is being adsorbed thereon. These parameters are in turn dictated bythe final concentration of acid gas that is to be stored in thecontainer. A discussion of adsorption of gaseous species onto surfacesthat is helpful in this respect is included in Daniels, F. et al.,“Experimental Physical Chemistry”, Seventh Edition, McGraw-Hill, pages369-374 (1970). While the inventors are not certain, it is believed thatthe attraction of the acid gas to the coating is physical in nature,involving an interaction of dipoles or induced dipoles, but may bechemical in nature involving chemical bonds, as when oxygen is adsorbedon charcoal. A combination of physical and chemical forces may be atwork as well. Thus, the surface area of a coating produced by thepractice of the present invention may be determined by the B.E.T.method, and preferably is at least about 1 m²/gram, more preferably atleast 10 m²/gram. If the coating is somewhat porous, the pore volume maybe determined by nitrogen adsorption isotherm methods, and is preferablyat least 0.1 ml/gram. The B.E.T. method is described in detail inBrunauer, S. Emmet, P. H., and Teller, E., J. Am. Chem. Soc., 60, 309-16(1938). The nitrogen adsorption isotherm method is described in detailin Barrett, E. P., Joyner, L. G. and Helenda, P. P., J. Am. Chem. Soc.,73, 373-80 (1951), incorporated by reference herein. In general, if theconcentration of acid gas to be stored in the container is 100 ppb, thenfor the same acid gas, same temperature and pressure, and same coating,the concentration of acid gas used in this step will be higher than ifthe ultimate concentration of acid gas is to be only 50 ppb, assumingadsorption is the governing pathway. An increase in temperature willtend to require an increase in concentration of acid gas, an increase inpressure, or both, to achieve the same degree of adsorption. Incontrast, a decrease in temperature will tend to require a decreasedconcentration of acid gas, a decrease in pressure, or both to achievethe same level of adsorption.

After the surface has been further deactivated by exposure to the acidgas at high concentration, a second evacuation step is carried out toremove excess acid gas. In this step, evacuation of the container iscarried out for a time sufficient to remove substantially all ofnon-adsorbed acid gas, leaving acid gas adsorbed on the coating. Oncethe metal container inner surface, or metal surface to be treated, iscleaned, and the reaction of organosilane with oxygen-containingcompounds completed (either with or with out adjuvants) to form acoating, the processes of the invention include evacuating the containerfor a time and vacuum sufficient to remove substantially allsilicon-containing compound(s) that has not reacted withoxygen-containing compounds. Preferably, this step is performed down toa vacuum of about 1 torr, more preferably down to 0.01 torr. Thetemperature during this evacuation process is not critical, but highertemperatures may tend to increase the removal rate of organosilane. Thiswill be balanced by safety issues, in that higher temperatures may bemore hazardous. Therefore, room temperature (about 25° C.), or slightlylower or slightly higher than room temperature is preferred. After thevacuum step is performed, it is followed by a N2 fill step.

When SO₂ is selected as the acid gas, steps in addition to the foreoingare preferable and include the following. After completion of thereaction between the silicon-containing and oxygen-containing compounds,but before the vacuum and N2 fill step, the cylinder is subjected tofive cycles of being filled with Nitrogen at 100 psi followed byventing. Similarly, after completion of the exposure of the internalcylinder surface to SO₂ (the selected acid gas), but before the vacuumand N2 fill step, the treated cylinder is again subjected to five cyclesof being filled with Nitrogen at 100 psi followed by venting.

The container is then filled with a gas composition comprising theintended low concentration of acid gas in the balance gas. Whilepreferred manufactured products of the invention comprise only a singleacid gas with one balance gas, two or more acid gases and/or two or morebalance gases may be used. Typical balance gases include noble gases,nitrogen, ethylene, propylene, and mixtures thereof.

As shown below in the Examples, application of the method of theinvention to acid gases having concentrations below 500 ppb exhibitsunexpectedly good stability. The unexpected stability is even moresurprising as the concentration utilized ranges from about 50 ppb toabout 100 ppb.

EXAMPLES

In the following examples, hydrogen sulfide concentrations were measuredusing a chemluminescence detector.

Examples 1-3

In order to betatest the process of the invention in a productionenvironment, a betatest was performed at a specialty gas fill plantlocated in Santa Fe Springs, Calif. All cylinders were kept and analyzedon site for approximately one month and then transferred to a laboratoryand maintained there for further analysis.

Each of the cylinders were treated as follows:

Step 1 (Vacuum Bake): Cylinders go through a vacuum/fill bake cycle fora minimum of 4 hours

Step 2 (Silane Passivation): Cylinders attached to manifold andvacuumed. Cylinders filled with 1% Silane in N₂ to 100 psig andmaintained for 1 day. Manifold vented and vacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinders attached tomanifold and vented. Cylinders go through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for 4 days. Manifold vented through a scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinders attached to manifold and vented outthrough scrubber. Cylinders go through a vacuum/N₂ fill cycle. Cylindersvacuumed for at least 2 hours.

Step 5 (Standard Filling): Cylinders filled to target concentration froma 10 ppm mother mixture in Nitrogen.

TABLE 1 Cylinder Size and Fill Concentration H₂S Fill ConcentrationExample Cylinder # Size (ppb) 1 42553 16 53.1 2 144244 30 48.5 3 14427030 96.9

TABLE 2 H₂S Concentration Over Time for Examples 1-3 Example 1: Example2: Example 3: Cyl. # 42553 Cyl. # 144244 Cyl. # 144270 days ppb H₂S daysppb H₂S days ppb H₂S 0 53.1 0 48.5 0 96.9 1 62 1 46.1 1 99 19 39.9 2048.1 20 90.7 77 43.5 78 46.51 78 101.57 110 43.9 132 50.8 132 100.5 18846.2 201 55.8 201 97.3 231 45.1 230 53.6 230 102.2 277 45.3 277 49.4 277103.6 532 39.3 329 44.8 329 92.5 691 33.2 532 44.9 532 95 691 33.9 69181.1

As best illustrated in FIG. 1, the H₂S concentration for Examples 1-3 isstable over an approximate 700 day period of time.

Examples 4-7 and Comparative Examples 1-7

Examples 4-7 were prepared as follows:

Step 1 (Vacuum Bake): Cylinders go through a vacuum/fill bake cycle fora minimum of 4 hours

Step 2 (Silane Passivation): Cylinders attached to manifold andvacuumed. Cylinders filled with 1% Silane in N₂ to 100 psig andmaintained for the time indicated in Table 3. Manifold vented andvacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinders attached tomanifold and vented. Cylinders go through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for the time indicated in Table 3. Manifold vented through ascrubber and vacuumed.

Step 4 (H₂S Removal): Cylinders attached to manifold and vented outthrough scrubber. Cylinders go through a vacuum/N₂ fill cycle. Cylindersvacuumed for at least 2 hours.

Step 5 (Standard Filling): Cylinders filled to target concentration froma 10 ppm mother mixture in Nitrogen.

Comparative Examples 1-3 and 7 were prepared as follows:

Step 1 (Vacuum Bake): Cylinders go through a vacuum/fill bake cycle fora minimum of 4 hours

Step 2 (Silane Passivation): Cylinders attached to manifold andvacuumed. Cylinders filled with 1% Silane in N₂ to 100 psig andmaintained for the time indicated in Table 3. Manifold vented andvacuumed.

Step 3 (Silane Remova): Cylinders attached to manifold and vented.Cylinders go through a vacuum/N₂ fill cycle. Cylinders vacuumed for atleast 2 hours.

Comparative Examples 4-6 were prepared as follows:

Step 1 (Vacuum Bake): Cylinders go through a vacuum/fill bake cycle fora minimum of 4 hours

Step 2 (H₂S Passivation): Cylinders filled with 5000 ppm H₂S in N₂ to100 psig and maintained for the time indicated in Table 3. Manifoldvented through a scrubber and vacuumed.

Step 3 (H₂S Removal): Cylinders attached to manifold and vented outthrough scrubber. Cylinders go through a vacuum/N₂ fill cycle. Cylindersvacuumed for at least 2 hours.

Step 4 (Standard Filling): Cylinders filled to target concentration froma 10 ppm mother mixture in Nitrogen.

TABLE 3 Cylinder Size, Silane and H₂S Passivation Periods, and FillConcentrations H₂S Fill Cylinder Silane conc. Cylinder # Size (days) H₂S(days) (ppb) Comp. Ex. 1 24271 Size 7 94 0 101.2 Comp. Ex. 2 24283 Size7 29 0 101.2 Comp. Ex. 3 24287 Size 7 96 0 101.2 Comp. Ex. 4 24235 Size7 0 42 101.2 Comp. Ex. 5 24305 Size 7 0 39 105.0 Comp. Ex. 6 24313 Size7 0 39 105.0 Ex. 4 24335 Size 7 35 14 105.0 Comp. Ex. 7 15042 Size 30 610 76.4 Ex. 5 15031 Size 30 27 30 104.0 Ex. 6 15035 Size 30 27 30 104.0Ex. 7 15039 Size 30 8 57 76.4

TABLE 4 H₂S Concentration Over Time for Comparative Examples 1-6 Comp.Ex. Comp. Ex. Comp. Ex. Comp. Ex. Comp. Ex. Comp. Ex. 1: Cyl. # 2: Cyl.# 3: Cyl. # 4: Cyl. # 5: Cyl. # 6: Cyl. # 24271 24283 24287 24235 2430524313 ppb ppb ppb ppb ppb ppb days H₂S days H₂S days H₂S days H₂S daysH₂S days H₂S 0 101.2 0 101.2 0 101.2 0 101.2 0 90 0 91 8 102.6 8 91.7 8108.8 1 86.37 2 91.7 2 97.5 15 77.34 15 82 15 73.8 5 90.7 6 87 6 97.2 2392.1 23 58 23 81.3 6 84.9 28 81.67 28 97 43 80.6 43 47.6 43 73.1 7 92.445 79.1 45 97.1 49 69.9 49 42.5 49 66.1 9 87.3 49 74 49 81.8 74 81.3 7476.3 13 84.3 57 68.2 57 94.1 101 76.7 101 67.7 14 87.1 77 60.1 77 86.6150 75 150 69 22 93 83 58.7 83 81.2 239 72.2 163 63.4 33 83.2 108 71.2108 100.7 296 61.8 239 64.8 36 95.4 135 67.2 135 101.8 319 65.7 296 5240 100.8 184 66.3 184 99.1 490 36.2 319 59.1 61 89.1 197 62.2 197 100.8490 21.7 78 84.3 273 56.9 273 101.8 81 82.4 524 13.9 330 96.3 89 84.6524 65.5 109 76.4 665 48.4 115 74.53 140 86.9 167 83.2 216 87.3 229 80.3362 69.7 385 66.4 447 59.6

TABLE 5 H₂S Concentration Over Time for Examples 4-7 & ComparativeExample 7 24335 15031 15035 15039 15042 ppb ppb ppb ppb ppb days H₂Sdays H₂S days H₂S days H₂S days H₂S 0 87 0 104 0 104 0 76.4 0 76.4 297.7 9 108.8 9 108.9 1 79.4 1 74.2 6 101 15 97.2 15 96 8 65.4 8 61.4 28105.5 23 96.8 23 100.5 9 72.8 9 59.2 45 96.4 43 91.2 43 97 29 73 29 52.149 99.4 44 103.6 44 112.6 30 71.6 30 55.3 57 100.2 49 86 49 89.2 35 66.635 50.5 77 87 50 93 50 98.8 36 73.1 36 48.3 83 90.2 52 100.7 52 102 3876.6 38 51.5 108 103.1 67 96.1 67 100 44 70.6 53 39.5 135 105.2 74 92.274 95.1 53 73.5 60 39.7 184 109.1 91 90.2 91 92.9 60 73 77 38.3 197103.9 92 94 92 95 77 65 78 41.9 273 109.9 114 91.1 114 93.7 78 71.1 10036.3 330 108 127 95.7 127 102.6 100 72.2 113 41.9 353 131.2 150 102.4150 102.2 113 78.4 136 40 415 123.3 183 97.8 183 94.3 136 78.1 169 35.4518 114.1 238 97.6 238 103.9 169 73.2 224 33.8 562 112.3 287 93.8 28493.9 224 79.5 270 25.1 660 104.4 381 99.6 381 111.8 270 70.1 451 0 867109.3 491 84.7 429 98.3 367 76.4 1023 102 574 93.9 497 95.2 477 70.8 62678 574 107.2 560 74.1 829 86.7 626 93.9 612 65 989 78.2 829 100.8 81570.2 989 87.3 975 63.3

As best shown in FIG. 2, Example 4 in comparison to only Silanepassivation or only H₂S passivation (for the same size cylinder)exhibited excellent stability.

As best shown in FIG. 3, Examples 5-7 in comparison to only Silanepassivation (for the same size cylinder) exhibited excellent stability.

Example 8

In an effort to study the effect of reducing production time to lessthan two weeks for low-level COS/H₂S in Nitrogen mixtures, thepassivation times were shortened. A cylinder used for the COS/H₂Smixture underwent the following treatment:

Example 8 was prepared as follows:

Step 1 (Vacuum Bake): Size 16 cylinder goes through a vacuum/fill bakecycle for a minimum of 4 hours

Step 2 (Silane Passivation): Cylinder attached to manifold and vacuumed.Cylinder filled with 1% Silane in N₂ to 100 psig and maintained for 3days. Manifold vented and vacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinder attached tomanifold and vented. Cylinder goes through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for 8 days. Manifold vented through a scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinder attached to manifold and vented outthrough scrubber. Cylinder goes through a vacuum/N₂ fill cycle. Cylindervacuumed for at least 2 hours.

Step 5 (Standard Filling): Cylinder filled to a concentration 52.1 ppbCOS and 49.7 ppb H₂S in Nitrogen.

TABLE 6 H₂S and COS Concentrations Over Time for Example 8 Example 8:Cylinder # 42589 days ppb H₂S ppb COS 0 49.7 52.1 2 59.9 52.4 32 50 64.438 57.9 69.9 114 57 55.5 197 48.6 56.1 401 50.3 58.3 576 56.2 48.7

As best shown in FIG. 4, Example 8 exhibited excellent stability.

Examples 9-11

The invention was also tested for H₂S and COS mixtures in balanceEthylene at approximate concentrations of about 100 ppb. Two Ethylenegrades were tested as the balance gas: 99.95% (CP grade) and 99.9995%(5N5 grade).

Example 9 was prepared as follows.

Step 1 (Vacuum Bake): Size 7 cylinder goes through a vacuum/fill bakecycle for a minimum of 4 hours

Step 2 (Silane Passivation): Cylinder attached to manifold and vacuumed.Cylinder filled with 1% Silane in N₂ to 100 psig and maintained for 4days. Manifold vented and vacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinder attached tomanifold and vented. Cylinder goes through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for 4 days. Manifold vented through a scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinder attached to manifold and vented outthrough scrubber. Cylinder goes through a vacuum/N₂ fill cycle. Cylindervacuumed for at least 2 hours.

Step 5 (Standard Filling): Filled with 106 ppb COS in 5N5 Ethylene.

Example 10 was prepared as follows:

Step 1 (Vacuum Bake): Size 16 cylinder goes through a vacuum/fill bakecycle for a minimum of 4 hours

Step 2 (Silane Passivation): Cylinder attached to manifold and vacuumed.Cylinder filled with 1% Silane in N₂ to 100 psig and maintained for 3days. Manifold vented and vacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinder attached tomanifold and vented. Cylinder goes through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for 9 days. Manifold vented through a scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinder attached to manifold and vented outthrough scrubber. Cylinder goes through a vacuum/N₂ fill cycle. Cylindervacuumed for at least 2 hours.

Step 5 (Standard Filling): Filled with 89.5 ppb H₂S in CP gradeEthylene.

Example 11 was prepared as follows:

Step 1 (Vacuum Bake): Size 16 cylinder goes through a vacuum/fill bakecycle for a minimum of 4 hours

Step 2 (Silane Passivation): Cylinder attached to manifold and vacuumed.Cylinder filled with 1% Silane in N₂ to 100 psig and maintained for 3days. Manifold vented and vacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinder attached tomanifold and vented. Cylinder goes through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for 8 days. Manifold vented through a scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinder attached to manifold and vented outthrough scrubber. Cylinder goes through a vacuum/N₂ fill cycle. Cylindervacuumed for at least 2 hours.

Step 5 (Standard Filling): Filled with 98.8 ppb COS in CP gradeEthylene.

TABLE 7 H₂S and COS Concentrations Over Time for Examples 9-11 Example9: Example 10: Example 11: Cylinder # 27525 Cylinder # 42573 Cylinder #42543 days ppb COS days ppb H₂S days ppb COS 0 106 0 89.5 0 98.8 1 131.92 81.4 2 80.4 7 76.4 32 111.3 38 120.6 23 94.7 38 124.9 112 119.4 55 109112 105.7 133 109.7 142 113.4 130 95 198 98.9 216 108.6 193 95.8 40184.3 237 82.8 366 85.9 576 100.5 302 89.7 401 88.3 680 78.6 576 76.7

As best shown in FIG. 5, Example 9-11 exhibited excellent stability.

Examples 12-13

The cylinder treatment of the invention was performed with an extra stepwhere the cylinder was filled with Nitrogen at 100 psi and vented fivetimes after each passivation with Silane and each passivation with SO₂.

Examples 12-13 were prepared as follows:

Step 1 (Vacuum Bake): Cylinder goes through a vacuum/fill bake cycle fora minimum of 4 hours

Step 2 (Silane Passivation): Cylinder attached to manifold and vacuumed.Cylinder filled with 1% Silane in N₂ to 100 psig and maintained for 43days.

Step 3 (Silane Removal and SO₂ Passivation): Manifold vented and filledwith N2 at 100 psig. This was repeated 4 times. Cylinder goes through avacuum/N₂ fill cycle. Vacuumed cylinders filled with 500 ppm SO₂ in N₂to 100 psig and maintained for 8 days. Manifold vented through ascrubber and vacuumed.

Step 4 (SO₂ Removal): Cylinder attached to manifold vented and filledwith N2 at 100 psig. This was repeated 4 times. They were vacuumed andthen filled with 100 psi of pure Propylene for 7 days. Cylinder attachedto manifold vented and filled with N2 at 100 psig. This was repeated 4times. Cylinder vacuumed for at least 2 hours.

Step 5 (Standard Filling): Filled with 100 ppb SO₂ in Propylene at 100psi.

TABLE 8 SO₂ Concentration Over Time for Examples 12-13 Example 12:Example 13: Cylinder # 6513 Cylinder # 6514 days ppb SO₂ days ppb SO₂ 0100 0 100 14 71 14 93 28 113 28 101 42 73 42 110 56 88 56 142 70 104 70129 100 102 100 129 130 112 130 127 170 108 170 140 210 105 210 114 26098 260 113 300 97 300 111

As best shown in FIG. 6, Example 12-13 exhibited excellent stability.

Examples 14-17 and Comparative Example 8

Examples 14-17 and Comparative Example 8 were prepared as follows:

Step 1 (Vacuum Brake): Cylinders go through a vacuum/fill bake cycle.

Step 2 (Silane Passivation): Cylinders attached to manifold andvacuumed. Cylinders filled with 1% Silane in N₂ to 100 psig andmaintained for the period indicated in Table 9. Manifold vented andvacuumed.

Step 3 (Silane Removal and H₂S Passivation): Cylinders attached tomanifold and vented. Cylinders go through a vacuum/N₂ fill cycle.Vacuumed cylinders filled with 5000 ppm H₂S in N₂ to 100 psig andmaintained for the period indicated in Table 9. Manifold vented througha scrubber and vacuumed.

Step 4 (H₂S Removal): Cylinders attached to manifold and vented outthrough scrubber. Cylinders go through a vacuum/N₂ fill cycle.

TABLE 9 Passivation Times for Ex. 14-17 and Comp. Ex. 8 SilanePassivation H₂S Passivation (days) (days) H₂S (ppb) Example 14 1 1 109.3Example 15 1 2 109.3 Example 16 1 3 110.6 Example 17 1 4 96.9Comparative 4 0 110.6 Example 8

TABLE 10 H₂S Concentration Over Time for Ex. 14-15 and Comp. Ex. 8 Comp.Ex. 8 Ex. 14 Ex. 15 days H₂S (ppb) days H₂S (ppb) days H₂S (ppb) 0 110.60 109.3 0 109.3 1 104.3 2 116.8 1 117.5 2 89.2 10 106.8 2 118.6 10 65 2397 10 102.7 23 46.1 29 100.8 23 93.3 29 42.2 36 111.6 29 91.1 36 45.3 4297.6 36 104 42 30.9 57 101.9 42 85.8 65 88.5 57 84.2 79 71.6 65 74.7 20538.9 79 58.1 115 38.5

TABLE 11 H₂S Concentration Over Time for Ex. 16-17 Ex. 16 Ex. 17 daysH₂S (ppb) days H₂S (ppb) 0 110.6 0 96.9 1 113.7 1 99 2 119.2 20 90.7 10110.7 78 101.6 23 108.1 132 100.5 29 113.2 201 97.3 36 123.6 230 102.242 114 277 103.6 57 124.3 329 92.5 65 116.1 79 88.9 115 92.7 269 80.9414 61.2

As best shown in FIG. 7, increasing the H₂S passivation time improvedstability.

Although the description herein is intended to be representative of theinvention, it is not intended to limit the scope of the appended claims.

1. An article of manufacture comprising: a) a container having aninternal space having a passivated internal metal surface, saidpassivated internal metal surface selected from the group consisting ofaluminum and aluminum alloys; and b) a composition to be stored in thecontainer, said composition comprising an acid gas and a balance gascontained within the internal space and in contact with the passivatedinternal metal surface; wherein i) the acid gas has an intendedconcentration in the balance gas of less than 500 ppb; ii) the acid gasis selected from the group consisting of carbon disulfide,carbonylsulfide, and compounds within the formulaY—S—X wherein S is sulfur, X and Y are the same or different and areindependently selected from the group consisting of hydrogen, alkyl,aryl, oxygen, hydoxyl, amine, aminosilane, and alcohol; and iii) thepassivated internal metal surface comprises A) a coating that is thereaction product of a silicon-containing material and anoxygen-containing material, and B) a coating that is an amount of theconcentrated acid gas adsorbed on or in the passivated internal metalsurface which is effective to enhance the stability of the intendedconcentration over time, the concentration of the concentrated acid gasbeing at least 50,000 times greater than the concentration of the acidgas of the composition that is to be stored in the container.
 2. Thearticle of manufacture of claim 1, wherein the acid gas is selected fromthe group consisting of hydrogen sulfide, carbonyl sulfide, sulfurdioxide, methylthiol, ethylthiol, n-propylthiol, i-propylthiol, andbenzylthiol.
 3. The article of manufacture of claim 1, wherein the acidgas is selected from the group consisting of hydrogen sulfide, carbonylsulfide, and sulfur dioxide.
 4. The article of manufacture of claim 1,wherein the silicon-containing material is selected from the groupconsisting of compounds within the general formula (II):SiR¹R²R³R⁴  (II) wherein R1, R2, R3, and R4 are the same or differentand are independently selected from the group consisting of hydrogen,halogen, amine, alkyl, aryl, halogenated alkyl, and halogenated aryl. 5.The article of manufacture of claim 1, wherein the oxygen-containingcompound is selected from the group consisting of moisture, molecularoxygen, metal oxides, and mixtures thereof.
 6. The article ofmanufacture of claim 1, wherein the silicon-containing compound issilane.
 7. The article of manufacture of claim 1, wherein thesilicon-containing compound is a methyl-containing silane selected fromthe group consisting of methylsilane, dimethylsilane, trimethylsilaneand tetramethylsilane.
 8. The article of manufacture of claim 1, whereinthe acid gas contained within the internal space has a concentration ofabout 50-100 ppb.
 9. The article of manufacture of claim 8, wherein theacid gas is hydrogen sulfide.
 10. The article of manufacture of claim 8,wherein the acid gas is carbonyl sulfide.
 11. The article of manufactureof claim 8, wherein the acid gas is sulfur dioxide.
 12. The article ofmanufacture of claim 1, wherein the balance gas is selected from thegroup consisting of noble gases, nitrogen, ethylene, propylene, andmixtures thereof.
 13. The article of manufacture of claim 1, wherein thearticle is selected from a piping system, a tubing system, a manifold, agas cylinder having a cylinder valve, and a ton unit.
 14. The article ofmanufacture of claim 13, wherein the internal metal surface to betreated is aluminum.
 15. The article of manufacture of claim 1, whereinthe internal metal surface to be treated is aluminum.